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4N CF3I Electronic Speciality Gas Supply and Application

2020-02-20 14:02

Beijing Yuji Science & Technology Co., Ltd. successfully developed a synthesizing process to produce iodotrifluoromethane (CF3I). Meantime, Beijing Yuji has purified iodotrifluoromethane, whose purity can achieve 99.99%.

Iodotrifluoromethane (CF3I), also known as trifluoromethyl iodide and trifluoroiodomethane, is a gas which has a very low GWP and serves a number of purposes, including use as a PFC substitute gas for manufacturing semiconductors and liquid crystals. High purity CF3I can be use as a dry etching gas in semiconductor industry.

Physical Data

Molecular Weight 162
Boiling Point (℃) 6
Vapor Pressure (bar, @0 ℃) 19.65
Critical Temperature (℃) 136.75
Critical Pressure (kPa) 3131
Liquid Density (g/ml) 1.553
GWP (100years) <5
ODP ≈0

Application formanufacturing semiconductors

CF3I has been used as a plasma dry etching gas for manufacturing semiconductors. In the process of manufacturing semiconductors compatible with 32-45nm-generation process technology, it was discovered that the use of CF3I resulted in a reduction of line edge roughness and an improvement in wiring reliability compared to products manufactured with conventional alternatives. It was also demonstrated that the use of CF3I combined with exposure to short wavelength extreme ultraviolet (EUV) light in the etching process is effective for manufacturing semiconductors compatible with next-generation 22 nm chip technology(Figure 1). CF3I Suppresses roughness of a surface and sidewall of the ArF photoresist in many cases (Figure 2).

After some years research and development, Beijing Yuji has made CF3I mass-produced. Beijing Yuji provides CF3I with purity that is above 99.99% for semiconductor industry. Meantime, we provide different cylinder sizes to meet customers’ needs.