As one of the manufacturers of fluorine-containing chemicals, Yuji Tech has the production and purification technology of HFC-41, whose purity can arrive Grade 4N(99.99%).
Methyl Fluoride (CH3F) , also known as Fluoromethane, Freon 41, Halocarbon-41 and HFC-41, is a non-toxic, liquefied and flammable gas at standard temperature and pressure. It is an environmentally friendly dry etching gas with low GWP, which shows very high performance in plasma etching of silicon compound films in semiconductor manufacturing.The physical properties, package and shipping are as follows.
|Boiling point (℃)||-78.4|
|Vapor pressure (bar, @0 ℃)||19.65|
|Critical temperature (℃)||44.5|
|Relative gas density (air = 1)||1.2|
|Gas Density (@15 °C, 1 atm, kg/m3)||2.18|
|Relative liquid density (water = 1)||0.61|
|Explosion limits (%vol)||2.6-21.7|
Used as a composition in a mixture with other nonflammable refrigerant
Used as a dry etching gas in silicon-based integrated circuits
As a dry etching gas for Spacer etching
Time variation in the total positive ion flux in CH3F-O2-He plasma pulsed at 1 kHz for 75%, 50%, 20% and 10% dcs and continuous excitation (CW).
1.A dielectric spacer, usually made of Si3N4, is also necessary around the gate to precisely define the channel length below the gate.